Jpn J Appl Phys 2009,48(05DA02):1–5.

2. Dong GF, Qiu Y: Pentacene thin-film transistors with Ta 2 O 5 as the gate dielectric. J Kor Phys Soc 2009,54(1):493–497.CrossRef 3. Zhu XH, Zhu JM, Li AD, Liu ZG, Ming NB: Challenges in atomic-scale characterization of high- k dielectrics and metal gate electrodes for advanced CMOS gate stacks. J Mater Sci Technol 2009,25(3):289–313. 4. International Technology Roadmap for Semiconductors [http://​public.​itrs.​net/​] 5. Rahmani M, Ahmadi MT, Abadi HKF, Saeidmanesh M, Akbari E, Ismail R: Analytical modeling of trilayer graphene nanoribbon Schottky-barrier FET for high-speed Mocetinostat order switching applications. Nanoscale Res Lett learn more 2013, 8:55.CrossRef 6. Ding SJ, Chen HB, Cui XM, Chen S, Sun QQ, Zhou P, Lu HL, Zhang DW, Shen C: Atomic layer deposition of high-density Pt nanodots on Al 2 O 3 film using (MeCp)Pt(Me) 3 and O 2 precursors for nonvolatile memory applications. Nanoscale Res Lett 2013, 8:80.CrossRef 7. Chalker PR, Werner M, Romani S, Potter RJ, Black K, Aspinall HC, Jones AC, Zhao CZ, Taylor S, Heys PN: Permittivity enhancement of hafnium dioxide high- k films by cerium doping. Appl Phys Lett 2008, 93:182911.CrossRef 8. Chen SH, Liao WS, Yang HC, Wang SJ, Liaw YG, Wang H, Gu HS, Wang MC: High-performance III-V MOSFET with nano-stacked

high- k gate dielectric and 3D fin-shaped structure. Nanoscale Res Lett 2012, 7:431.CrossRef 9. Wang NVP-HSP990 JC, Lin CT, Chen Vorinostat in vitro CH: Gadolinium oxide nanocrystal nonvolatile memory with HfO 2 /Al 2 O 3 nanostructure tunneling layers. Nanoscale Res Lett 2012, 7:177.CrossRef 10. Shi L, Liu ZG: Characterization upon electrical hysteresis and thermal diffusion of TiAl 3 O x dielectric film. Nanoscale Res Lett 2011,

6:557.CrossRef 11. Khomenkova L, Sahu BS, Slaoui A, Gourbilleau F: Hf-based high- k materials for Si nanocrystal floating gate memories. Nanoscale Res Lett 2011, 6:172.CrossRef 12. Chen FH, Her JL, Shao YH, Matsuda YH, Pan TM: Structural and electrical characteristics of high- k Er 2 O 3 and Er 2 TiO 5 gate dielectrics for a-IGZO thin-film transistors. Nanoscale Res Lett 2013, 8:18.CrossRef 13. Dalapati G, Wong TS, Li Y, Chia C, Das A, Mahata C, Gao H, Chattopadhyay S, Kumar M, Seng H, Maiti C, Chi D: Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO 2 /Al 2 O 3 gate stack: study of Ge auto-doping and p-type Zn doping. Nanoscale Res Lett 2012, 7:99.CrossRef 14. An YT, Labbé C, Khomenkova L, Morales M, Portier X, Gourbilleau F: Microstructure and optical properties of Pr 3+ -doped hafnium silicate films. Nanoscale Res Lett 2013, 8:43.CrossRef 15. Zhou P, Ye L, Sun QQ, Wang PF, Jiang AQ, Ding SJ, Zhang DW: Effect of concurrent joule heat and charge trapping on RESET for NbAlO fabricated by atomic layer deposition. Nanoscale Res Lett 2013, 8:91.CrossRef 16.